Lab Chemical
TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS
Product code RXSOL-60-6605-695
TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS
Description
It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
Safety data sheet: Sigma-Aldrich MSDS for TM...
Application
Application
TMAH solution is widely used in the electronics industry as a developer or cleaner. TMAH is typically one of several ingredients in etching / stripping mixtures, although it may also be used as a pure chemical. It is often used in solution in water, and less frequently, in methanol.